Filtro UV K&F Concept Nano-X MRC para Fujifilm X100/X100S/X100F/X100V/X100VI (KF01.2703)

The K&F Concept Nano-X MRC UV Filter is a premium lens protection filter designed specifically for Fujifilm X100 series cameras (X100, X100S, X100F, X100V, X100VI). It replaces the original lens front ring and provides a custom fit without affecting the camera's compact form factor. The filter features advanced Nano-X Multi-Resistant Coating (MRC) technology, offering superior protection against dust, scratches, moisture, and atmospheric haze while maintaining exceptional optical clarity.

Advantages

This UV filter not only safeguards your valuable lens but also enhances image quality by reducing haze and improving contrast. The 28-layer multi-coating ensures >99.6% light transmittance, minimizing reflections and flare. The ultra-slim aerospace aluminum alloy frame adds no extra bulk, preserving the camera's sleek design. Water and oil repellent properties make cleaning effortless, while scratch resistance ensures long-lasting durability.

Suitable for

• Fujifilm X100
• Fujifilm X100S
• Fujifilm X100F
• Fujifilm X100V
• Fujifilm X100VI

Key specifications

• Filter Type: UV Filter
• Coating Technology: Nano-X Multi-Resistant Coating (MRC)
• Optical Material: High-Definition Optical Glass
• Frame Material: Aerospace Aluminum Alloy
• Mounting Type: Direct screw-on (replaces original lens front ring)
• Light Transmittance: >99.6%
• Water & Oil Repellent: Yes
• Scratch Resistant: Yes
• Anti-Reflection: Yes
• UV Absorption: Yes
• Frame Profile: Ultra-slim
• Number of Coatings: 28 Layers
• Color: Black

Recommendations

For optimal protection and image quality, always use a high-quality UV filter like the K&F Concept Nano-X MRC. It is an essential accessory for photographers who want to keep their Fujifilm X100 series lens safe without compromising on performance.