Filtro UV MRC Nano-X K&F Concept 55mm

The K&F Concept Nano-X MRC UV Filter is a premium ultraviolet protection filter designed for photographers who demand the highest optical clarity and lens protection. Crafted with Japanese AGC optical glass and advanced Nano-X multi-resistant coating, this 55mm filter reduces haze, improves contrast, and safeguards your lens from dust, moisture, scratches, and UV light without affecting color balance.

Advantages

This filter offers exceptional light transmittance (>99.6%) and 28 layers of nano-coating that provide hydrophobic, oleophobic, anti-reflective, anti-static, and scratch-resistant properties. The ultra-slim 3.3mm aerospace-grade aluminum alloy frame prevents vignetting on wide-angle lenses, while the double-threaded design allows for stacking additional filters or lens caps.

Suitable for

• Photographers using lenses with a 55mm filter thread
• Outdoor and travel photography requiring lens protection from UV rays and elements
• Professionals seeking a high-transparency filter with minimal optical degradation

Key specifications

• Filter Type: UV (Ultraviolet)
• Filter Diameter: 55mm
• Coating Technology: Nano-X Multi-Resistant Coating (MRC)
• Number of Coating Layers: 28 layers
• Optical Material: Japanese AGC Optical Glass
• Frame Material: Aerospace-grade Aluminum Alloy
• Frame Profile: Ultra-slim (3.3mm)
• Light Transmittance: >99.6%
• UV Light Reduction: Yes
• Water Resistance: Yes (Hydrophobic)
• Oil Resistance: Yes (Oleophobic)
• Scratch Resistance: Yes
• Anti-Reflective: Yes
• Anti-Static: Yes
• Thread Type: Double-threaded (front and rear)
• Optical Effect: Reduces haze, improves clarity, protects lens
• Color Cast: None
• Compatibility: Lenses with 55mm filter thread
• Series: K&F Concept Nano-X

Recommendations

For optimal performance, keep the filter clean using a microfiber cloth. This filter is an excellent choice for both amateur and professional photographers looking to protect their investment while maintaining image quality.